Description: We propose development of a near-unity yield array by perfecting the wafer bonding and back etch processes. We believe this fabrication development is the most critical element to successfully demonstrate a flight-qualified large microshutter array.

Benefits: Large-format NextGen Micro-Shutter Arrays (NGMSA) are a key enabling technology for the LUVEx flagship mission recommended in the Astro20 Decadal Survey. After successfully fielding small-format (128 X 64) NGMSA on-board FORTIS, there was an expressed interest in employing a large-format (736 X 384) NGMSA for the HabEx, CETUS, and LUVOIR concept studies. Specifically, whereas the NGMSA developed for FORTIS could be fabricated on 100mm silicon substrates, the required geometry for the large format necessitated fabrication on 150mm substrates